摘要
为了制定"技术报告"类国际标准ISO TR22335,2005年2月ISO/TC201技术委员会委托美国国家标准学会负责召集工作小组,小组成员由中国、匈牙利、日本、英国、美国、瑞士、韩国、菲律宾、俄罗斯等9个国家组成,中国等3个国家的6个实验室参加了实验比对,其中清华大学分析中心扫描俄歇电子能谱仪测得的标准偏差值最接近实际值,测得结果为:利用单孔栅网对97nm的热氧化二氧化硅片进行界面溅射测量,测量的孔内(IA)标准偏差值为0.06min,孔外(OA)标准偏差值为0.03min;氧化层厚度测量的标准偏差值为0.4nm。
It was decided at the 15th Plenary meeting of TC-201/SC4 that a 5th round robin for the ISO TC- 201/SC4/SC-22335 ＂Sputter Mesh＂ standard would be undertaken. At this meeting it was further decided that SC-22335 would be changed to a ＂Technical Report. ＂ There are 9 countries in the group member; they are China, Hungary, Japan, UK, USA, Switzerland, R. O. Korea, Philippines and Russia. There are 6 laboratories of three countries that participated in the experiment comparison, including one in China, one in Japan and one in USA. The standard deviation by AES in Tsinghua University of China is the most closed to the actual value on sputtering interface. After comparing the inside aperture （IA） and outside aperture （OA） sputter rate, the （IA） is 0.06 min and the （OA） is 0.03 mini the oxide layer thickness is 0.4 nm.
出处
《实验技术与管理》
CAS
北大核心
2013年第4期185-186,200,共3页
Experimental Technology and Management
基金
科技部创新方法工作专项项目(2009IM030500
2012IM030500)
