期刊文献+

应用于晶圆级真空封装的玻璃通孔金属化工艺研究 被引量:1

Study of TGVprocessapplied to wafer level package
下载PDF
导出
摘要 采用玻璃喷砂打孔、阳极键合、玻璃通孔镀膜工艺,成功制备出基于TGV的玻璃封帽结构,并应用于微机电(MEMS)器件加工中。 Relative to TSV (Through Silicon Via) process, study of TGV (Through Glass Via)Process is less. It has not been reported in the country. In the paper, glass sandblasting process, anodic bonding process, glass via sputtering process are used for TGV glass cap structures, and are applied for MEMS devices fabrication.
出处 《战术导弹控制技术》 2013年第1期42-45,共4页
关键词 TGV MEMS 阳极键合 晶圆级真空封装 TGV MEMS anodic bonding wafer level vacuum package
  • 相关文献

参考文献2

  • 1O. Le Traon, D. Janiaud, M. Pernice, S. Masson, S. Mull- er,J - Y. Tridera. A New Quartz Monolithic Differential Vibrating Beam Aecelerometer, Proceedings of lhe 2006 IEEE International Conference,2006, 6 - 14.
  • 2He G. and Najafi K. , A Single- Crystal Silicon Vibra- ting Ring Gyroscope, MEMS 2002 - 15th IEEE Interna- tional Conference on Micro Electro Meehanical Systems, Las Vegas, NV, January 2002.

同被引文献5

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部