硅基质上图案化金膜的制备

Fabrication of patterned Au film by photolithography on Si substrate

介绍了一项材料化学综合实验。该实验利用紫外光刻技术在硅基底上制备出图案化的金膜,采用冷热台偏光显微镜对硅片上图形的质量进行检查。通过该实验,不仅可以了解光刻技术的相关基础知识,掌握图案化金膜的常见制备方法和常用表征手段,还能在后续的实验中以图案化Au膜作为模板,设计制备出多种图案化的半导体、聚合物纳米结构。该实验可以在本科生及研究生实验教学中推广。

The fabrication of the patterned Au film on Si substrate was introduced in a material chemistry experiment.The patterned Au film was fabricated on Si substrate by the photolithography.The quality of the graphs on Si substrate is examined by the hot and cold polarizing microscopy.The experiment is easy to operate.The time and steps are reasonable.It is valuable to spread for the undergraduate and graduate students.