摘要
利用电子束真空蒸发方法制备了厚度100nm的Ni80Fe20薄膜,研究了磁场退火温度对薄膜磁畴结构的影响。利用振动样品磁强计测量了磁滞回线,利用磁力显微镜观察了薄膜的表面形貌和磁畴结构。结果表明:磁畴结构为明显的条状畴,磁畴宽度最大值约为860nm;随着磁场退火温度的升高,磁畴取向趋于沿垂直膜面方向,退火温度为600℃时,沿着主畴的畴壁形成了细小的横向细畴结构。
Ni80Fe20 thin films（thickness of 100 nm） were prepared by vacuum electron-beam deposition method,and effects of magnetic field annealing temperature on the magnetic domain structure of Ni80Fe20 thin films were investigated.The magnetic hysteresis loops of Ni80Fe20 thin films were measured by vibrating sample magnetometer（VSM）,Surface morphology and magnetic domains structure were observed by magnetic force microscope（MFM）.The experiment results show that the magnetic domain structure is obvious stripe-shaped domains,and the maximum width value of magnetic domains is about 860 nm;with annealing temperatures increase,the domain is oriented along the vertical direction to the thin films surface.Small transverse domain structure is formed along domain walls of the main domain when the annealing temperature is 600 ℃.
出处
《实验技术与管理》
CAS
北大核心
2013年第3期56-59,共4页
Experimental Technology and Management
基金
北京科技大学研究型教学示范课建设项目(JY2011SFK18)
北京科技大学教育教学改革研究项目(重点)(JG2011Z14)
关键词
Ni80Fe20薄膜
磁畴
磁场退火
Ni80Fe20 thin films
magnetic domain
magnetic field annealing
