氧化物薄膜抗1064nm脉冲激光损伤的特性研究

1064 nm Pulse Laser Damage of Oxide Coatings

对几种氧化物介质膜料的单层膜、增透膜及高反膜的激光损伤特性进行了实验研究,分别测试了单脉冲和多脉冲1064nm激光的损伤阈值,分析和讨论了实验的物理现象及其结果。研究表明SiO2、Gd2O3、Er2O3、Y2O3具有激光损伤阈值高、损伤程度轻的特点,特别对10Hz激光而言,更是明显;增透膜及高反膜加λ2层SiO2对其激光零损伤概率阈值影响不大,但在能量密度大于损伤阈值的情况下,可明显降低薄膜的激光损伤程度和损伤几率。

The laser induced damage of several kinds of dielectric thin film materials in λ/2 thin films forms, AR and HR coatings has been studied. The damage threshold has been measured by the 1064 nm laser with single shot and 10 Hz pulse multishot respectively. The data and damage morphologies are discussed in details and some conclusion are drawn concerning pulsed laser induced damage of the coatings:a) optical materials Er 2O 3,Y 2O 3,Gd 2O 3 etc. have high damage threshold with 1064 nm laser at single shot and multishot, specially to 10 Hz laser irradiation, the damage size is smaller than other materials.b) the λ/2 layer SiO 2 of AR and HR coating has no influence on the onset threshold, but can obviously drop the possibility and level of the damage.