光刻机多面体主基板的设计与算法

Design and Algorithm for Polyhedron Metro Frame of Lithographic Machine

论述了一种扫描式投影曝光光刻机主基板的设计制造过程,在该主基板上需要安装投影物镜和多个纳米级高精度测量分系统。为满足设计需求,规划了整机内部结构所需占用的最小三维空间,并基于计算几何的方法设计主基板和测量支架。首先进行数据的采集,对主基板和测量支架的安装面上的接口和支撑位置进行有效定义,明确所有相关接口在三维空间内的位置数据;其次采用凸包算法求解获得主基板多面体的外形轮廓,由于光刻机内部结构的复杂性,还要对模型进行局部修正;再次,结合平面切剖多面体算法设计主基板内部结构;最后,经有限元仿真验证取得了提高振动模态和减小结构质量的双重改进效果,达到了设计性能指标并且该结构适合工程制造。

A metrology frame for scanner lithographic machine was created,which was required to set--up optical projector and various nanometer--level measurement sub--system. To meet the re- quirements with minimized occupied--3D space, position data were collected firstly. That means to de- fine all the interfaces and assembly positions on both metrology frame and measurement frame. Con- vex hull algorithm of computational geometry was used to settle the metrology frame outside polyhed- ron profile. Due to the complexity of machine structure, a local modification was followed to improve the model. Furthermore, plate cutting polyhedron algorithm was introduced to design the metrology frame inner structure. Finally, with finite element analysis and verification, a clear improvement can be visualized for both high modal value and low weight material consuming. Design performance tar- get was reached; structure was fit to engineering manufacture.