摘要
A1Sb/InAs quantum well （QW） structures and InAs films on GaAs （001） substrates were grown by molecular beam epitaxy （MBE）. We investigated the dependence of electron mobility and two-dimensional electron gas （2DEG） concen- tration on the thickness of an InAs Channel. It is found that electron mobility as high as 19050 cm2 · V-1 · s-1 has been achieved for an InAs channel of 22.5 nm. The Hall devices with high sensitivity and good temperature stability were fabricated based on the A1Sb/InAs QW structures. Their sensitivity is markedly superior to Hall devices of InAs films.
A1Sb/InAs quantum well （QW） structures and InAs films on GaAs （001） substrates were grown by molecular beam epitaxy （MBE）. We investigated the dependence of electron mobility and two-dimensional electron gas （2DEG） concen- tration on the thickness of an InAs Channel. It is found that electron mobility as high as 19050 cm2 · V-1 · s-1 has been achieved for an InAs channel of 22.5 nm. The Hall devices with high sensitivity and good temperature stability were fabricated based on the A1Sb/InAs QW structures. Their sensitivity is markedly superior to Hall devices of InAs films.
基金
Project supported by the Knowledge Innovation Program of the Chinese Academy of Sciences (Grant No. ISCAS2009T04)
the National Natural Science Foundation of China (Grant Nos. 61204012 and 61274049)
the Beijing Natural Science Foundation, China (Grant No. 2112040)
the Beijing Nova Program, China (Grant No. 2010B056)
