光源长度与荧光粉条缩颈的关系

Ralation betweenn Length of Light Source and the Neck of Phosphor Stripes

在条状荧光屏的涂屏制造中 ,需要通过曝光刻蚀来形成 R、G、B荧光粉条。由于荫罩槽孔的间断性 ,荫罩槽孔间的桥遮挡光线 ,使屏上沿 Y向的照度分布不均匀 ,形成周期性的照度明暗分布 ,造成粉条周期性的宽窄变化 ,这一现象行业内称为缩颈。但根据荫罩结构 ,选择适当长度的光源 ,可将缩颈降低到最小程度。本篇论文就是阐述如何借助计算机辅助设计优选光源长度的方法。

The RGB phosphor stripe are formed by exposure and etching in the screen coating process.Because of the discontinuity of mask slots,the mask bridges between mask slots can block some of light ray coming from light source produce a non uniform lux distribution on screen along Y directon,and the brightness there may vary periodically from bright to dark.As a result,the width of phosphor stripes varies preiodically from wide to narrow.According to mask struture,the variation can be minimized by adopting light source with a proper length.In this paper we will disouss the way to design the light source with optimum length by CAD.