摘要
总结了窗口片的抛光工艺现状,对玻璃窗口片的研磨、抛光和清洗原理及主要工艺因素进行了详细的分析。在考虑磨料、抛光辅料、环境、清洗工艺、抛光液浓度及pH值、磨盘转速、压力等多种工艺条件的基础上,进行了多次实验,并对抛光工艺改进前后的窗口片表面进行了扫描电镜(SEM)检测。结果表明,使用新抛光工艺加工的窗口片表面粗糙度、擦痕等微观缺陷明显得到改善,零级表面疵病标准的成品率达到23%。
The state of grinding process of optical window was summarized. Then the polishing and cleaning mechanisms and main process parameters were analyzed. By taking into consideration of such factors as ambient condition, grinding material, the pH value and concentration of polishing slurry, rotating speed and stress of muller, lots of experiments were carried out. Scanning electron microscope （SEM） was used to detect the optical window surface before and after applying the modified polishing process. It is shown that the surface defects and roughness are obviously improved and the rate of zero standard surface defects reaches to 23%.
出处
《半导体光电》
CAS
CSCD
北大核心
2013年第2期251-254,共4页
Semiconductor Optoelectronics
关键词
表面疵病
研磨
抛光
超声波清洗
surface defects
grinding
polishing
ultrasonic cleaning
