摘要
通过巯基链转移支化聚合法,以4-乙烯基苄硫醇(VBT)为支化单体,丙烯酸正丁酯(BA)、苯乙烯(St)、丙烯酸(AA)为共聚单体,偶氮二异丁腈(AIBN)为引发剂,丙二醇甲醚醋酸酯(PMA)为溶剂,合成了HBPs。利用甲基丙烯酸缩水甘油酯(GMA)环氧基与HBP羧基的反应,向HBP中引入双键制备了具有碱溶性和光固化特性的G-HBP。采用FT-IR、1H-NMR、DSC、凝胶色谱(GPC)-激光光散射(LS)-示差黏度(DV)三检测仪表征了聚合物的结构及性能,验证了其超支化结构;将合成的G-HBP用作负性光致抗蚀剂的主体树脂,测试了光致抗蚀剂显影成像过程参数。结果表明,显影时间为40 s,去膜时间为30 s,感度级数为7级。抗蚀剂性能优异,分辨率可达到40μm。
Hyperbranched polymers （HBPs） were synthesized by mercapto chain-transfer branched polymerization （MCTBP）. HBPs were modified by glycidyl methacrylate （GMA）. The structure of the hyperbranched polymers was characterized by FT-IR and 1H-NMR. Parameters of structure and properties such as molecular weight （Mw） and intrinsic viscosity （[η]） were measured by three-detection of gel permeation chromatography（GPC）-laser light scattering（ LS）-differential viscosity detectors （DV）. A negative-type photoresist based on modified branched polymers was prepared using an optimized composition. Parameters for imaging development of photoresist were measured. The results show that the photoresist exhibits excellent performancel The developing time is 40 s, the stripping time is 30s, the sensitivity is 7 Level, and the circuit reaches the level of 40μm.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
2013年第5期9-12,共4页
Polymer Materials Science & Engineering
基金
江苏省产学研联合创新基金(BY2011118)
关键词
超支化
巯基链转移
光致抗蚀剂
hyperbranched
mercapto chain-transfer
photoresist
