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碳化硅衬底精密加工技术 被引量:1

A Fine Processing Technology of Silicon Carbide
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摘要 介绍了一种包含多线切割、研磨、抛光等主要工序的75 mm(3英寸)碳化硅衬底精密加工技术,该技术成功对本单位自主研制的碳化硅衬底进行精密加工。实验过程中使用了几何参数测试仪、强光灯、微分干涉显微镜(DIC)、原子力显微镜(AFM)、扫描电镜(SEM)等检测手段对加工工艺效果进行监控。通过该技术制备出了几何尺寸参数良好、表面质量优良的碳化硅晶片。 A fine processing technology which was consist of sawing,grinding and polishing was investigated in this article.Ingots that were produced by our own were processed in the experiment.Geometric Parameter Tester,Bright Lights,Differential Interference Microscopy(DIM),Atomic Force Microscope(AFM) and Scanning Electron Microscope(SEM) were used to assess the result of the experiment.Wafers with excellent geometric Parameters and surface quality were made by the method.
出处 《电子工业专用设备》 2013年第5期23-26,64,共5页 Equipment for Electronic Products Manufacturing
关键词 碳化硅衬底 精密加工 多线切割 研磨 抛光 粗糙度 Silicon carbide Fine processing technology Wire sawing Grinding Polishing Roughness
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参考文献3

  • 1Yasseen AA, Zorman CA, Mehregany. Roughness reduc- tion of 3C-SiC surfaces using SiC-Based mechanical polishing slurries I J]. Journal of the Electrochemical Society, 1999, 146 (1):327-330.
  • 2王志芳.晶片研磨速率及损伤层的研究[J].红外与激光工程,2006,35(z5):188-191. 被引量:4
  • 3M Jing, NO Wood, R Komanduri. Chemo-mechanical polishing (CMP) of silicon nitride (Si3N4) work material with various abrasive [J].Wear, 1998,220 (1):59-71.

二级参考文献1

  • 1[1]田守信,马仁勇,郭宝金.光学零件加工的技术[M].长春:长春光学精密机械学院,1983.

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