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固结磨料抛光LiB_3O_5晶体的抛光液优化 被引量:7

Optimization of Fixed Abrasive Polishing Slurry for LiB_3O_5 Crystal
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摘要 LiB3O5(LBO)非线性光学晶体软、脆的特点增加了超精密加工的难度。采用固结磨料抛光技术对LBO晶体(110)面进行抛光,研究酸性、中性和碱性抛光液pH值调节剂及pH值对晶体抛光材料去除率、表面形貌和表面粗糙度的影响。结果表明:酸性抛光液对LBO晶体表面的腐蚀作用太大,中性抛光液的腐蚀作用太小,不适合抛光LBO晶体;乙二胺配制pH值为11的无磨料碱性抛光液固结磨料抛光LBO晶体(110)面,获得高的晶体表面质量,表面粗糙度Sa为1.94nm,表面损伤小。 It is rather difficult to process LiB3O5 (LBO) nonlinear optical crystal by ultraprecision machining due to its soft and brittle properties. The LBO crystal (110) surface was polished by using a fixed abrasive polishing technology. The effects of acidic, neutral and alkaline slurry pH regulator and pH value on the removal rate of crystal polishing, surface topography and surface roughness of the material were investigated. The results show that the corrosive effect of the acidic slurry on the LBO crystal surface is dominant, and the effect of the neutral slurry on the LBO crystal surface is slight, causing the inappropriate polishing of LBO crystal. However, the abrasive-free alkaline slurry with ethylenediarnine and pH value of 11 can be effective for fixed abrasive polishing of LBO crystal (110) surface, obtaining a high surface quality of the crystal with the surface roughness Sa of 1.94nm and the rather slight surface damage.
出处 《硅酸盐学报》 EI CAS CSCD 北大核心 2013年第6期789-796,共8页 Journal of The Chinese Ceramic Society
基金 国家自然科学基金项目(50905086 51175260) 中央高校基本科研业务费专项资金(NP2012506) 江苏省高校优势学科建设工程资助
关键词 三硼酸锂晶体 固结磨料抛光 材料去除率 表面形貌 表面粗糙度 lithium triborate crystal fixed abrasive polishing material removal rate surface topography surface roughness
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