摘要
本文讨论了二氧化硅在氢氟酸缓冲(BHF)腐蚀溶液中的腐蚀特性。研究了二氧化硅在腐蚀液中的腐蚀速率、表面粗糙度及腐蚀深度随着NH4F配比、HF配比及腐蚀液温度的变化规律。通过改变腐蚀液配比和腐蚀温度等条件,从腐蚀速率及表面形貌等方面进行了比较和分析,确定不同条件下二氧化硅的腐蚀速率,以及腐蚀条件对二氧化硅表面粗糙度及表面深度的影响。
The etching properties of silicon dioxide in buffered hydrogen fluoride corrosion solutions were discussed. The changing rules of the corrosion rates in both the solutions with different temperatures and densities were studied. The results show that the surface roughness and corrosion depth of silicon dioxide relate to the etching rate which controlled by both temperature condition and composition concentration. We have conformed corrosion rate of silicon dioxide variation under different conditions. So the proper techniques of chemical corrosion can be chosen at different aims in the practical applications.
出处
《科技信息》
2013年第13期196-197,共2页
Science & Technology Information
关键词
二氧化硅
腐蚀速率
腐蚀深度
表面形貌
粗糙度
Silicon dioxide
Corrosion rate
Corrosion depth
Surface morphology
Roughness
