微波等离子体化学气相沉积工艺对透明金刚石膜质量的影响

EFFECTS OF MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION TECHNOLOGY ON QUALITY OF TRANSPARENT DIAMOND FILM

在自制的 2 4 50MHz/5kW不锈钢谐振腔型微波等离子体化学气相沉积装置中研究了基片预处理和工艺参数对微波等离子体化学气相沉积金刚石膜质量的影响 ,研究了提高成核密度和沉积速率的方法 ,用SEM ,XRD ,FTIR ,Raman和AFM分析了金刚石膜的质量 .结果表明 :用纳米金刚石粉研磨单晶硅基片 ,在沉积气压 6.0kPa,CH4 /H2 的体积流量比为 0 .75%时 ,可沉积出红外透光率达 68% ,表面粗糙度为 1 1 4 .1 0nm的透明金刚石膜 ,其透光率接近Ⅱa 天然金刚石 .

The effects of pretreatment methods of substrates and process parameters on the quality of diamond films by microwave plasma chemical vapor deposition (MPCVD) in stainless steel resonant cavity mode equipment with domestic 2 450 MHz/5 kW were studied. The ways to improve nucleation density and depositional speed were also investigated. The quality of diamond film obtained was analyzed by SEM, XRD, Fourier transform infrared spectrometer (FTIR), laser Raman spectrometer (Raman), atomic force microscopy (AFM). The results show that transparent diamond film which infrared transmission of 68% and surface roughness of 114.10 nm can be deposited on single crystal silicon substrate polished by nanoscale diamond powder under the condition of 6.0 kPa pressure and CH 4/H 2 flow ratio of 0.75% by volume. The transmission value is close to that of Ⅱa natural diamond.