基于单光弹调制器的米勒矩阵测量误差分析

Measurement Error Analysis for Mueller Matrix Based on a Single Photo-Elastic Modulator

针对已有单光弹调制器米勒矩阵测量技术缺乏定量误差分析的不足,提出了单光弹调制器米勒矩阵测量误差方程,给出了相对误差分析方法,并结合矩阵条件数得到了降低米勒矩阵各元素最大相对误差的两组1/4波片方位角优化组合。实验结果表明,该两组1/4波片方位角优化组合,测量得到的待测1/4波片米勒矩阵各元素的最大相对误差分别为0.12%和0.20%,相比传统1/4波片方位角优化组合{-90°,-45°,30°,60°}条件下得到的各元素最大相对误差为0.83%,分别降低了85.54%和75.90%。

A measurement error equation and a relative error analysis method for the Mueller matrix measurement technique based on a single photo-elastic modulator are proposed. Considering the relative error and the condition number, two optimum angle sets for the quarter-wave plate are obtained, which diminish the maximum relative error of each element of the Mueller matrix. The experimental results show that the maximum relative errors of each element of the Mueller matrix of the measured quarter-wave plate are 0.12% and 0.20% respectively by using the two optimum angle sets above. Compared to the maximum relative error of 0.83% of the traditional optimum angle sets {-90°,-45°,30°,60°} for the quarter-wave plate, the maximum relative errors of each element of the Mueller matrix of the measured quarter-wave plate are decreased by 85.54% and 75.90% respectively by using the two optimum angle sets above.