笼型聚倍半硅氧烷修饰介孔SiO_2结构的研究

Study on structure of G-POSS modified mesoporous silica

采用合成的氨基丙基介孔SiO2(NH2-MPS)与八环氧基聚倍半硅氧烷(G-POSS)反应,借助POSS较大的尺寸对介孔SiO2进行部分的封端,制备并改性粒径均一、尺寸可控的介孔SiO2纳米粒子,形成POSS-MPS结构。采用红外(FT-IR)法、X射线衍射、N2吸附-脱附和透射电镜(TEM)等测试手段对其性2能和结构进行表征和测定,确定POSS修饰MPS的较优合成工艺。

Using the reation of synthesized aminopropyl mesoporous silica （NH2-MPS） with glycidyl ether polyhedral oligomeric silsesquioxanes （G-POSS）,the MPS was partially closed with G-POSS with larger size to prepare and modify the MPS nano particles with uniform size and controllable size and form the structure of POSS-MPS.The performance and structure were Characterized and determined by FT-IR,X-ray diffraction,nitrogen adsorption-desorption and transmission electron microscopy （TEM）,and the optimal synthesis process of POSS-MPS was determined.