摘要
本文研究了工业硅中微量杂质元素Fe、Al、Ca、Mg、Mn电感耦合等离子体原子发射光谱 (ICP -AES)的测定方法 样品以HNO3、HF和高HClO4溶解 ,蒸干 ,用盐酸浸取 ,定容 ,在选定的仪器条件和测定介质下测定结果 该法简便、快速、准确 ,选用多元素测定方式 ,可以同时测出这 5种元素的结果 这 5种元素的回收率在 93 9% - 10 3 9%之间 ,相对标准偏差在 1 3 % - 4 0
WT5BZ]This paper provides a method for the determination of trace amount of Fe, Al, Ca, Mg, and Mn in silicon metal by inductively coupled plasma atomic emission spectrometry(ICP AES).The samples were dissolved by mitric acid,hydrofluoric acid and perchloric acid.Heat to dry,Add hydrochloric acid to dissolve and transfer the solution into flask.Dilute to mark with water.Determine the five elements at the selecting conditions.This method is rapid,simple and accuracy.The five elements can be determined simultaneously by means of selecting the multi element determining mold.The recoveries of five elements are between 93 9% and 103 9% and the relative standard deviation betweem 1.3% and 4.0%. [WT5HZ]
出处
《许昌师专学报》
2000年第5期47-49,共3页
Journal of Xuchang Teachers College(Social Science Edition)
关键词
工业硅
杂质元素
微量分析
光谱分析
WT5BZ]ICP AES
Silicon metal
Iron
Alrminum
Calcium
Magnesium
Manganese