PCVD法渗Si的研究

Research of Steel Infusing Silicon by PCVD Technique

为解决硅含量超过 3.5 %的硅钢片无法轧制成薄片的矛盾 ,探讨用等离子体化学气相沉积法 (PCVD法 ) ,在 (0 .1～ 0 .3) mm厚的普通硅钢片表面涂硅 ,然后进行短时间高温扩散 ,使硅钢片平均含硅量达 6 .5 % ,磁性能达到或超过冷轧取向硅钢片性能。

To solve the problem that silicon content of silicon steel exceeding 3.5% may not be rolled into film,the surface of a plain silicon steel sheet with a thickness of 0.1mm～0.3mm is painted with silicon by PCVD and then treated at a high temperature for a short time.At the end of the process,the silicon steel sheet is infused with an average silicon content of 6.5%.The magnetic properties have been improved,which can reach or exceed the level achieved in cold rolling directions in silicon steel sheet.