对苯二酚在希夫碱铜配合物修饰电极上的电化学行为及其测定

Electrochemical behavior and measurement of hydroquinone on Schiff base copper complexe modified electrode

合成席夫碱过渡金属配合物[Cu(Sal-β-Ala)(3,5-DMPz)2].2H2O(Sal为水杨醛,β-Ala为β-丙氨酸,3,5-DMPz为3,5-二甲基吡唑),并采用电沉积方法制备[Cu(Sal-β-Ala)(3,5-DMPz)2]/GC修饰电极,考察对苯二酚在该修饰电极表面的电化学行为,确定氧化电流与对苯二酚浓度之间的线性关系,并优化检测条件。结果表明:[Cu(Sal-β-Ala)(3,5-DMPz)2]/GC修饰电极对对苯二酚有良好的催化作用,且对苯二酚在修饰电极表面的电化学过程为扩散控制。在对苯二酚浓度为4～120μmol/L范围内,氧化峰电流与对苯二酚浓度之间存在良好的线性关系,检出限为0.28μmol/L。

The Schiff base transition metal complexe,[Cu（Sal-β-Ala）（3,5-DMPz）2]·2H2O,was synthetized.The electrodeposition method was used to prepare [Cu（Sal-β-Ala）（3,5-DMPz）2] modified electrodes.The electrochemical behavior of hydroquinone on the modified electrode surface was studied.The results showed that [Cu（Sal-β-Ala）（3,5-DMPz）2] modified electrodes had good catalytic effect on hydroquinone and the electrochemical process of hydroquinone on modified electrodes was diffusion-controlled.The modified electrode showed a widely linear concentration range for hydroquinone from 4 μmol/L to 120 μmol/L with a detection limit of 0.28 μmol/L（S/N=3）.