铜经MBT和HQ钝化处理后在3.5%NaCl溶液中的电化学行为

Electrochemical behavior of copper passivated by MBT and HQ in 3.5%NaCl solution

采用循环伏安曲线、极化曲线和交流阻抗谱研究铜经2-巯基苯并噻唑(MBT)和8-羟基喹啉(HQ)钝化处理后在3.5%NaCl溶液中的电化学行为,利用扫描电镜观察铜经缓蚀溶液处理前后在3.5%NaCl盐水中的腐蚀形貌。结果表明,MBT或HQ在铜表面形成的络合物膜能明显改善铜在3.5%NaCl溶液中的耐蚀能力;经0.5 mmol/L MBT+0.5 mmol/L HQ复配溶液处理后,其缓蚀率达90.3%;缓蚀剂的缓蚀效果由大到小的顺序为:MBT+HQ,MBT,HQ,Blank。分析了MBT与HQ两者具有缓蚀协同作用的机理。

The performance of benzotriazole（BTA） and 2-mercaptobenzothiazole（MBT） as corrosion inhibitors for copper was investigated in 3.5% NaC1 solution. Potentiodynamic polarization, cyclic voltammogram and AC impedance spectroscopy were used to study the electrochemical behaviors of copper electrodes passivated by inhibitors and their complex. Corrosion morphologies of copper electrodes in 3.5%NaC1 solution were observed directly by scannihg electron microscopy （SEM）. The results show that the complex compound films formatted by MBT or HQ on copper surface apparently increase the copper electrode anticorrosion in 3.5%NaC1 solution. The anticorrosive efficiency of 0.5 mmol/LMBT＋0.5 mmol/L HQ combined inhibitor is 90.3%. The anticorrosive effect order of those corrosion inhibitors is MBT＋HQ 〉MBT〉HQ〉Blank. The mechanism of the synergistic effect for MBT and HQ has also been discussed in detail.