摘要
介绍了硅外延生长技术,综述了应用于硅外延的分子束外延(MBE)、化学气相沉积(CVD)、液相沉积(LPE)三种工艺,并介绍了Si基外延材料器件的应用。
Silicon epitaxy growth technology is introduced, and three kinds of technologies applied to silicon epitaxy are summa- rized : molecular beam epitaxy ( MBE), chemical vapor deposition (CVD) , liquid deposition ( LPE), and the application of Si base epitaxi- al material device is also introduced.
出处
《云南冶金》
2013年第3期46-50,共5页
Yunnan Metallurgy