摘要
采用射频磁控溅射技术在ITO衬底上沉积制备了ZnO薄膜,作为结构为ITO/ZnO/P3HT∶PCBM/Ag的太阳能电池的电子传输层。并用X射线衍射,透射谱等手段测试表征了溅射ZnO薄膜的结构特征和光学特性。结果表明,ZnO薄膜沿c轴即垂直于衬底的(002)晶向择优生长,在400～800nm可见光谱范围的平均透射谱为84.5%。通过测试器件的I-V特性,器件表现出了0.614%的能量转换效率。
ZnO thin film which used as the electron-transporting layer for the ITO/ZnO/P3HT PCBM/Ag solar cell was prepared on ITO substrate by RF magnetron sputtering. The structural and optical properties were measured and characterized by using X-ray diffractometer and UV-vis spectrometer. It can be seen that ZnO film was grown with a pre- ferred c-axis orientation （002） perpendicular to the substrate. The average transmittance of the ZnO film was 84. 5 % in vis- ible light region （400-800nm）. The device showed a power conversion efficiency value of 0. 614G, observed from the I-V characterization measurement.
出处
《化工新型材料》
CAS
CSCD
北大核心
2013年第6期159-161,共3页
New Chemical Materials
基金
河南省高校科技创新人才支持计划(Grant No 2002006)
河南省教育厅自然科学基金(2009B48003)
