提升水冷系统温度控制精度的实验研究

Study on Improving the Temperature Control Precision of Cooling Water Circuit System

光刻机环境温度控制要求水冷系统的温控精度高(±0.01℃)、响应速度快。本文对影响温控精度的各种因素进行研究分析,并基于目前±0.1℃的水冷系统,提出增加制冷旁通、水冷旁通、增大冷却水供应流量、降低加热功率等改进措施,并进行实验研究。研究结果表明:改进后系统的温控精度达到±0.01℃、对外流量与系统响应速度不发生变化。

The environment temperature control of lithography requires high-precision （±0.01℃）, rapid respond of cooling water circuit system. After studying on influence factors of temperature control, on the basis of ±0.1℃ cooling water circuit system, bring forward optimizing measures： adding refrigeration bypass, adding water circuit bypass, increasing cooling water flux, decreasing the heat power, and the experiment result shows that the precision of the system is ±0.01℃ and the export flux and the respond speed keep unchanging.