金黄色铬膜层的脉冲电沉积及其表征

Electrodeposition of Golden Chromium by Pulse Current and Surface Features of the Film

本文采用方波脉冲电流电沉积法,探索方波脉冲参数对金黄色铬膜层形成的影响,并采用xps等表面分析手段对膜层进行表征.实验结果表明:在CrO_3水溶液中采用脉冲电流沉积金黄色铬膜层,脉冲参数的改变直接影响沉积层的厚度及其色调.采用较高的脉冲电流及较小的脉冲周期和占空比,可获得结合力良好,颜色均匀的膜层.较适宜的条件为Ipc40～60A/dm^2;T40～60ms;t_1/t_1+t_2 2/10～4/10;沉积时间为30～60s;膜层主要由CrOOH,CrPO_4,Cr(O),H_2O及吸附于表面的CrO_4^(2-),PO_4^(3-)所组成.厚度范围为100～350nm.膜层表面形貌为团状沉积物.

Effect of parameters in square pulse plating on the formation of golden chromium film was studied and the film obtained was characterized by XPS etc. Experiment showed that thickness and colour of the chromium film obtained from CrO_3 solution vary with the parameters employed and that good film can be deposited by applying higher pulse current with shorter pulse cycle and lower duty ratio. Proper conditions for deposition would be I_(pc) 40～60A/dm^2, T 40～60ms, t_1/(t_1+t_2)20～40% and deposition time 30～60s. The film is mainly composed of CrOOH, CrPO_4, Cr(O), H_2O with small quantity of anions CrO_4^(2-), PO_4~(3-_ being adsorbed on the surface. Thickness of the film is about 100～350nm. Surface morphology of the film appears to be nodular structure.