Na_2WO_4-WO_3-ZnO体系熔盐镀钨

Tungsten electrodeposition in Na_2WO_4-WO_3-ZnO molten salts

对Na2 WO4 WO3 ZnO体系熔盐镀钨工艺进行了详细研究 ,得到了获得金属钨镀层的工艺条件。结果表明 :在空气气氛中 ,当氧化钨的浓度为 1 5%～ 30 %时 ,于 850～ 950℃能得到金属钨镀层且镀层表面平整 ;当其它条件都相同时 ,在铜基体上获得钨镀层比钼基体上所需的温度略高一些 ;扫描电镜照片显示钨镀层与钼基体之间有明显分界面 ,元素线扫描结果证实镀层与钼基体间扩散层厚度仅为 2 .5μm ,基本不形成扩散层 ;不同电流密度下所获得的钨镀层X射线衍射表明镀层中存在织构。

The tungsten electrodeposition process in Na 2WO 4 WO 3 ZnO molten salts has been approached in details. The optimized conditions for tungsten coatings have been obtained. When the concentration of WO 3 ranges between 15% and 30%(mole fraction) a plain tungsten coating can be achieved in an open air condition at 850～950 ℃. The temperature for tungsten coating on copper substrate is higher than that on molybdenum. SEM shows that there is a distinct interface between tungsten coating and substrate. ELS(element linear sweep) indicates that there is a very thin diffusion layer between tungsten coating and molybdenum substrate. X ray diffraction displays that there are textures in the tungsten coatings. [