摘要
微弧氧化过程中,弧斑燃烧特性是直接影响微弧氧化膜层结构、膜层性能的重要因素。研究了常规微弧氧化和低能耗微弧氧化放电过程中弧斑燃烧的特性。用光谱仪和高速摄像机分别研究了微弧氧化过程中的等离子放电特性及弧斑燃烧时间特性。结果表明,常规微弧氧化过程中多种离子参与等离子放电,而在低能耗微弧氧化过程中只检测到Na+参与等离子体放电。低能耗微弧氧化过程中,相邻脉冲同一位置连续放电情况较少。常规微弧氧化过程中,在上一脉冲中放电较为剧烈的位置下一脉冲来临时仍可以优先放电,在同一位置脉冲来临时发生放电的连续时间可以达到数百微秒。
Characteristics of microarc is an important factor which has direct effect on the structure and performance of the coating during micro-arc oxidation (MAO). Characteristics of microarc during normal MAO and low energy consumption MAO was investigated. Optical spectroscopy and high speed camera were used to survey the characteristics of microare and burning time of microarc. The results show that many kinds ions take part in the plasma discharge during normal MAO while only Na ~ is detected during low energy consumption MAO. During low energy consumption MAO few microarcs appear at the same place when the next pulse comes. While the dicharge happenes first at the place where a microarc dicharges strongly when the next pulse comes during normal MAO. And at the same place the microarc could last for hundreds of microseconds.
出处
《金属热处理》
CAS
CSCD
北大核心
2013年第7期81-85,共5页
Heat Treatment of Metals
关键词
微弧氧化
弧斑
光谱
micro-arc oxidation
microarc
optical spectroscopy