氧离子束辅助激光制备平面织构的YBCO膜

In-Plane Aligned YBa_2Cu_3O_(7-x) (YBCO) Film Prepared by Laser Ablation only with O^+ Ion Beam Assistance

应用氧离子束辅助准分子脉冲激光沉积薄膜技术 ,先在不锈钢基底上室温下淀积出平面织构的钇稳锆(YSZ)缓冲层薄膜 ,再在YSZ/不锈钢上 750℃下制备出了平面织构和高临界电流密度YBa2 Cu3 O7-x(YBCO)薄膜 .YSZ和YBCO薄膜都为C 轴取向和平面织构的 ,YSZ( 2 0 2 )和YBCO( 1 0 3 )的X射线 (扫描衍射峰的全宽半峰值分别为 2 0°和 1 2°.YBCO薄膜的临界温度和临界电流密度分别为 91K(R =0 )和 7.2× 1 0 5A/cm2 ( 77K ,无外磁场 ) .

High critical current density and in plane aligned YBa 2Cu 3O 7-x (YBCO) film was fabricated on textured yttria stabilized zirconia (YSZ) buffer layer deposited on stainless steel tape by laser ablation only with O+ ion beam assistance. The values of X ray Phi scan full width at half maximum (FWHM) for YSZ(202) and YBCO (103) are 20° and 12°, respectively. The critical current density of YBCO film is 7.2×10 5?A/cm 2 at liquid nitrogen temperature and zero field, and the critical temperature of it is 91?K.