钨硅酸光敏高分子膜的制备和光色性研究

Preparation and Photochromism of a Film Between Tungstosilisic Acid and Polymer

用旋转涂布法制得了PVA -H4 SiW12 O4 0 体系的光敏膜 ,研究了膜对光的响应情况 ,发现体系对光的响应时间与体系内各成份的浓度无关 ,红外结果表明光色性的产生源于体系内PVA的 -OH基与钨硅酸阴离子中Oc的相互作用 ,其过程具有可逆性 .

The photosensitive film was prepared by spin_coating method. The photochromism of the film has been studied, the results of witch indicate the reaction time of the film for light has nothing to do with the concentration of the film. The photosensitivity results from the interaction between the -OH of PVA and the Oc of the anion, and its process is revisible.