常压介质阻挡放电非平衡等离子体渗氮研究

Research with Non-equilibrium Plasma Nitriding by Using Medium under Normal Pressure to Stop Discharging

利用介质阻挡放电 ,在自行研制的设备上进行常压非平衡等离子体渗氮的研究。研究表明 ,该新工艺不仅在很短时间内在试样表面得到很深的渗层和白亮层 ,而且省去了真空放电下必须的真空设备 ,整个工艺过程操作简便 ,是一种很有发展前景的新工艺。

By using medium to stop discharging, the non-equilibrium plasma nitriding under normal pressure can be made in self developed equipment.The research shows that this technology could not only make the much deep effusion layer as well as the white and bright layer appear on the specimen surface in short time, but also disuse the vacuum equipment which is necessary under vacuum discharging. The operation of the whole process is simple and convenient. It's a new technology which has a good development prospect.