摘要
采用Ti/W复合靶 ,用多弧离子镀技术沉积了Ti-W -N多元多层膜 ,并对其组织结构与性能进行了研究 .结果表明 :在本试验条件下多元膜的结构形式为 (Ti,W ) 2 N ,最佳多层膜的结构形式为基体 /Ti/TiN/ (TiyW1-y)N/ (Ti,W) 2 N ,并具有较高的显微硬度和极低的孔隙率 ,在 80 0℃具有很好的抗氧化性能 .在沉积过程中存在着多元合金膜层与复合靶的成分离析现象 ,这与靶材的结构有关 .
Presents the multi element layer Ti-W-N films deposited by multi arc ion plating using the Ti/W composite cathode target and their microstructure and properties, and coucludes from the results that the multi element films consisted of (Ti, W) 2N mainly, and the best form of multi layer was the matrix/Ti/TiN/ (Ti y W 1-y )N/(Ti,W) 2N, which had low porosity and high micro hardness and excellent oxidation resistance at 800 ℃. The composition demixing phenomena between films and composite target was analyzed.
出处
《材料科学与工艺》
EI
CAS
CSCD
2000年第3期38-40,共3页
Materials Science and Technology
基金
广东省高教厅基金项目(970032)
三束材料改性国家重点实验项目(960011)
关键词
多弧离子镀
Ti-W-N多元膜
多层膜
组织与性能
multi arc ion plating
Ti-W-N film
multi layer film
microstructure and properties
