摘要
为实现高效连续自动化生产,满足大规模工业化生产需求,研发设计了一种干法等离子体刻蚀机的新型装载腔,可实现3盘、6盘或更多盘数晶片的不间断连续自动化刻蚀,提高了生产效率。
A new type of load lock for ICP dry etcher is designed for high-efficiency,automatic and large-scale industrial production. The new type of load lock can deposit three or six or more trays filled with wafers to etch continuously and automatically,and improve production efficiency.
出处
《制造技术与机床》
北大核心
2013年第3期60-61,共2页
Manufacturing Technology & Machine Tool
