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Photochemical degradation of nonylphenol in aqueous solution: The impact of pH and hydroxyl radical promoters

Photochemical degradation of nonylphenol in aqueous solution: The impact of pH and hydroxyl radical promoters
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摘要 The degradation of nonylphenol (NP) in aqueous solution with UV, H202/UV, and Fenton/photo-Fenton processes was studied. The efficacy of direct and hydrogen peroxide photolysis proved to be dependent on the pH value. The addition of H202 to UV treatment improved NP degradation. The application of UV photolysis and the H202/UV system at pH 7 resulted in low pseudo first-order rate constants at 104 sec1 . In the experiments at elevated pH values the pseudo-first order rate constants increased to 103 sec1 . The efficacy of the Fenton process was lower in comparison with UV and hydrogen peroxide photolysis. The addition of UV irradiation to the H202/Fe2+ system substantially improved NP degradation efficacy. In terms of performance, the photo-Fenton process was similar to the H202/UV process. The most favourable process for complete nonylphenol degradation considering both operational cost and treatment efficacy was H202/UV at pH 11 and 250 μmol/L H202 . The degradation of nonylphenol (NP) in aqueous solution with UV, H202/UV, and Fenton/photo-Fenton processes was studied. The efficacy of direct and hydrogen peroxide photolysis proved to be dependent on the pH value. The addition of H202 to UV treatment improved NP degradation. The application of UV photolysis and the H202/UV system at pH 7 resulted in low pseudo first-order rate constants at 104 sec1 . In the experiments at elevated pH values the pseudo-first order rate constants increased to 103 sec1 . The efficacy of the Fenton process was lower in comparison with UV and hydrogen peroxide photolysis. The addition of UV irradiation to the H202/Fe2+ system substantially improved NP degradation efficacy. In terms of performance, the photo-Fenton process was similar to the H202/UV process. The most favourable process for complete nonylphenol degradation considering both operational cost and treatment efficacy was H202/UV at pH 11 and 250 μmol/L H202 .
出处 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2013年第7期1326-1330,共5页 环境科学学报(英文版)
基金 funded by the Estonian Science Foundation(Grant No.8186) the Estonian Research Council(project IUT1-7) partially supported by graduate school "Functional materials and technologies" funded by the European Social Fund under project1.2.0401.09-0079 in Estonia
关键词 AOPS endocrine disrupting compound photo-Fenton process PHOTOLYSIS UVC radiation AOPs endocrine disrupting compound photo-Fenton process photolysis UVC radiation
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