浅议ITO靶材的制备方法及发展趋势

Shallow Analyses the Preparation Methods and Development Trend of ITO Target

系统地阐述了ITO靶材的性质、特点和用途,重点介绍了目前常用制备ITO靶材的烧结工艺和成型方法的发展现状及对应特点。在对目前国内外ITO靶材的发展情况和发展现状进行分析的基础上,对ITO靶材未来低电阻率、高密度、尺寸大型化等发展趋势进行了展望。

The properties, characteristics and application of the ITO target are systematically expounded in this paper, Especial the sintering process and molding method of ITO target. Prospect low resistivity, high density and jumbo size the development trend of ITO target materials in future, basing on the analysis the status quo and development of ITO target materials .