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Effect of the V/Ⅲ ratio during buffer layer growth on the yellow and blue luminescence in undoped GaN epilayer 被引量:2

Effect of the V/Ⅲ ratio during buffer layer growth on the yellow and blue luminescence in undoped GaN epilayer
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摘要 Effect of the V/III ratio during buffer layer growth on the yellow and blue luminescence in undoped GaN epilayer has been studied by means of photoluminescence spectroscopy and high resolution X-ray diffraction.It is found that the densities of screw and edge threading dislocations increase with the V/III ratio of the buffer layer,and the intensities of the yellow luminescence(YL) and blue luminescence(BL) emissions also increase dramatically.However,the density ratio of the edge threading dislocation to the screw threading dislocation remains invariant,as well as the intensity ratio of YL emission to BL emission.It can be concluded from these phenomena that the edge threading dislocation and screw threading dislocation can enhance the YL and BL emissions,respectively. Effect of the V/III ratio during buffer layer growth on the yellow and blue luminescence in undoped GaN epilayer has been studied by means of photoluminescence spectroscopy and high resolution X-ray diffraction.It is found that the densities of screw and edge threading dislocations increase with the V/III ratio of the buffer layer,and the intensities of the yellow luminescence(YL) and blue luminescence(BL) emissions also increase dramatically.However,the density ratio of the edge threading dislocation to the screw threading dislocation remains invariant,as well as the intensity ratio of YL emission to BL emission.It can be concluded from these phenomena that the edge threading dislocation and screw threading dislocation can enhance the YL and BL emissions,respectively.
出处 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2013年第9期1694-1698,共5页 中国科学:物理学、力学、天文学(英文版)
基金 supported by the Special Funds for Major State Basic Research Project (Grant Nos.2011CB301900,2012CB619304,and 2012CB619200) the Hi-tech Research Project (Grant No.2011AA03A103) the National Natural Science Foundation of China (Grant Nos.60990311,60820106003,60906025,60936004,and 61176063) the Natural Science Foundation of Jiangsu Province (Grant Nos.BK2008019,BK2011010,BK2010385,BK2009255,and BK2010178) the Program Granted for Scientific Innovation Research of College Graduate in Jiangsu Province (Grant No.CXLX12_0049) the Research Funds from NJU-Yangzhou Institute of Opto-electronics a project funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions
关键词 蓝色发光 生长过程 发光率 缓冲层 外延层 GAN 黄色 掺杂 yellow luminescence,blue luminescence,V/Ⅲ ratio
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  • 1Ambacher O. Growth and applications of group III-nitrides. J Phys D-Appl Phys, 1998, 31:2653-2710.
  • 2Amano H, Sawaki N, Akasaki I. Metalorganic vapor phase epitaxial growth of a high quality GaN film using an A1N buffer layer. Appl Phys Lett, 1986, 48:353-355.
  • 3Nakamura. GaN growth using GaN buffer layer. Jpn J Appl Phys, 1991, 30:L1705-L1707.
  • 4Kuznia J N, Khan M A, Olson D T. Influence of buffer layers on the deposition of high quality single crystal GaN over sapphire substrates. J Appl Phys, 1993, 73:4700-4702.
  • 5Hersee S D, Ramer J, Zheng K, et al. The role of the low temperature buffer layer and layer thickness in the optimization of OMVPE growth of GaN on sapphire. J Electron Mater, 1995, 24:1519-1523.
  • 6Yi M S, Lee H H, Kim D J, et al. Effect of growth temperature on GaN nucleation layers. Appl Phys Lett, 1999, 75:2187-2189.
  • 7Keller S, Kapolnek D, Keller B P, et al. Effect of the trimethylgalli- um flow during nucleation layer growth on the properties of GaN grown on sapphire. Jpn J Appl Phys, 1996, 35:L285-L288.
  • 8Kim K S, Oh C S, Lee K J, et al. Effects of growth rate of a GaN buffer layer on the properties of GaN on a sapphire substrate. J Appl Phys, 1999, 85:8441-8444.
  • 9Ito T, Sumiya M, Takano Y, et al. Influence of thermal annealing on GaN buffer layers and the property of subsequent GaN layers grown by metalorganic chemical vapor deposition. Jpn J Appl Phys, 1998: 38:649-653.
  • 10Ogino T, Aoki M. Mechanism of yellow luminescence in GaN. Jpn J Appl Phys, 1980, 19:2395-2405.

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