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Geometry optimization in planetary rotation stage for thickness uniformity of films on spherical substrates

Geometry optimization in planetary rotation stage for thickness uniformity of films on spherical substrates
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摘要 We report the simulation results on the thickness uniformity of optical coatings deposited on spherical substrates by optimizing the geometric configuration parameters, such as tilting angle of the substrate holder and position of the evaporation source in a 1 000-mm-diameter planetary rotation stage (PRS). We reveal that good film uniformity on convex spherical surfaces or flat substrates, as well as concave surfaces with weak to moderate curvatures can be obtained through appropriate tilting of the substrate holder. For 300-mm-diameter substrates with clear aperture to radius of curvature (CA/RoC) between 0.3 and 0.7, the achievable film uniformity is above 99%. The source position is optimized to achieve good film uniformity. We report the simulation results on the thickness uniformity of optical coatings deposited on spherical substrates by optimizing the geometric configuration parameters, such as tilting angle of the substrate holder and position of the evaporation source in a 1 000-mm-diameter planetary rotation stage (PRS). We reveal that good film uniformity on convex spherical surfaces or flat substrates, as well as concave surfaces with weak to moderate curvatures can be obtained through appropriate tilting of the substrate holder. For 300-mm-diameter substrates with clear aperture to radius of curvature (CA/RoC) between 0.3 and 0.7, the achievable film uniformity is above 99%. The source position is optimized to achieve good film uniformity.
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2013年第13期65-68,共4页 中国光学快报(英文版)
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