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激光轴向偏焦法平整化CVD金刚石膜 被引量:1

Laser flatting chemical vapor deposition diamond films by axial offset-focus
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摘要 利用Nd:YAG型金刚石精密激光切割机,采用激光轴向偏焦法对化学气相沉积(CVD)法制备的金刚石膜表面进行扫描式平整化处理,利用扫描电子显微镜(SEM)、粗糙度仪和金相显微镜对平整化后的金刚石表面进行表征,研究了激光充电电压和焦点位置对扫描凹槽宽度和深度的影响,以及扫描间距对平整化效果的影响。研究结果表明:扫描凹槽宽度随激光充电电压的升高而增大;凹槽深度随激光充电电压的升高而增大,随偏焦量的增大而增大。激光轴向偏焦法对CVD金刚石膜进行平整化处理后,其粗糙度显著减小,利用氢等离子体对其表面进行刻蚀处理,能够有效去除表层石墨,从而达到理想的平整化效果。 Inhomogeneous chemical vapor deposition (CVD) diamond thick films are flatted by a Nd..YAG laser cutting ma chine with axial offset-focus. The influences of laser voltage, laser frequency and focus position on the diameter and depth of scan ning spot are researched respectively. In addition, the influence of scanning step on leveling result, which is characterized by a scanning electron microscope(SEM), a roughmeter and a optical microscope, is studied. The results show that the increase of la ser voltage or focus offset contributes to the increase of depth of scanning spot, and the width of scanning groove will increase with the increase of laser voltage. The roughness of the CVD diamond films is reduced significantly after a flatting process, and the graphite on the surface of the diamond film due to laser processing is efficiently removed by etching of hydrogen plasma.
出处 《强激光与粒子束》 EI CAS CSCD 北大核心 2013年第8期1916-1920,共5页 High Power Laser and Particle Beams
基金 国家自然科学基金项目(10875093)
关键词 激光 轴向偏焦法 平整化 CVD金刚石膜 laser axial offset-focus flatting CVD diamond film
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参考文献11

  • 1Erdemir A,Halter M,Fenske G R,et al.Durability and tribological performance of smooth diamond films produced by Ar-Cso microwaveplasmas and by laser polishing[J].Surface and Coatings Technology,1997,94/95:537-542.
  • 2Baranauskas V,Peled A,Trava-Airoldi V J,et al.Morphological studies of laser etching processes in self sustained CVD diamond wafers[J].Applied Surface Science,1994,79/80:129-135.
  • 3吕宪义,金曾孙,杨广亮.用EA-CVD方法制备的大尺寸金刚石厚膜的品质和膜厚均匀性的研究[J].新型炭材料,2005,20(3):270-273. 被引量:3
  • 4满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002,17(1):62-70. 被引量:53
  • 5Pimenov S M,Smolin A A,Ralchenko V G,et al.UV laser processing of diamond films effects of irradiation conditions on the properties oflaser-treated diamond film surfaces[J].Diamond and Related Materials,1993,2(2):291-297.
  • 6Odake S,Ohfuji H,Okuchi T,et al.Pulsed laser processing of nano-polycrystalline diamond:A comparative study with single crystal dia-mond[J].Diamond and Related Materials,2009,18(5):877-880.
  • 7季国顺,张永康.激光抛光化学气相沉积金刚石膜[J].激光技术,2003,27(2):106-109. 被引量:17
  • 8方向阳.CVD金刚石膜激光铲平切割工艺研究[J].宁夏工程技术,2003,2(2):157-160. 被引量:8
  • 9费拉里AC,罗伯逊J.碳材料的拉曼光谱--从纳米管道金刚石[M].北京:化学工业出版社,2007:243-252.
  • 10Angus J C,Will H A,Stanko W S.Growth of diamond seed crystals by vapor deposition[J].Journal of Applied Physics,1968,39(6):2915-2922.

二级参考文献20

共引文献81

同被引文献17

  • 1戴忠玲,毛明,王友年.等离子体刻蚀工艺的物理基础[J].物理,2006,35(8):693-698. 被引量:19
  • 2严朝辉,汪建华,满卫东,熊军.CVD金刚石厚膜的机械抛光研究[J].金刚石与磨料磨具工程,2007,27(3):32-35. 被引量:16
  • 3Eversole W G. Synthesis of diamond: US[P]. 1962-3030187.
  • 4Malshe A P, Park B S, Brown W D, et al. A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates[J]. Diamond and Related Materials, 1999, 8(7) : 1198-1213.
  • 5Chou W C, Chao C L, Chien H H, et al. Investigation of thermo chemical polishing of CVD diamond film[J]. Key Engineering Materials, 2007, 329:195 -200.
  • 6Towery D, Fury M A. Chemical mechanical polishing of polymer films[J]. Journal of Electronic Materials, 1998, 27(10) : 1088-1094.
  • 7Bello I, Fung M K, Zhang W J, et al. Effects at reactive ion etching of CVD diamond[J]. Thin Solid Films, 2000, 368(2) :222-226.
  • 8Tang C J, Neves A J, Fernandes A J S, et al. A new elegant technique for polishing CVD diamond films[J]. Diamond and Related Materi als, 2003, 12(8) :1411-1416.
  • 9Bernard M, Deneuville A, Ortega L, et al. Electron cyclotron resonance oxygen plasma etching of diamond[J]. Diamondand Related Ma terials, 2004, 13(2):287 291.
  • 10Asmussen J. Electron cyclotron resonance microwave discharges for etching and thin film deposition[J]. Journal of Vacuum Science Technology A : Vacuum, SurJaces, and Films, 1989, 7(3) :883-893.

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