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基板二次预对准定心定向数学模型的研究

Research on the mathematical model of secondary pre-alignment eccentricity and orientation
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摘要 高精度的预对准分系统是设计现代光刻机需要解决的核心问题之一。在光刻机上载基板的工作过程中,需要进行多次基板对准,主要有:基板预对准、基板二次预对准、基板对准。为了建立基板二次预对准定心定向数学模型,基于基板二次预对准的工作原理,提出了计算定心定向的算法,对该算法进行了仿真分析,并根据输入输出建立了定心定向数学模型。该数学模型的建立,为提高二次预对准精度提供了依据,对实际应用有一定的指导作用。 High-precision pre-alignment sub-system is a crucial component for modem lithography equipment. There are several alignment actions in the process of uploading wafer, including wafer pre-alignment, wafer secondary pre-alignment and wafer alignment. In order to establish the mathematical model of secondary pre-alignment eccentricity and orientation, the algorithm of computing eccentricity and orientation based on the principle of wafer secondary pre-alignment is designed in this paper. Then it simulates the algorithm and the mathematical model of secondary pre^alignment eccentricity and orientation was established based on the input and output. The establishing of this model can provide basis for improving the precision of secondary pre-alignment which is useful in practical application.
出处 《电子设计工程》 2013年第15期98-101,共4页 Electronic Design Engineering
关键词 光刻机 二次对准 定心定向 硅片 lithography machine wafer secondary pre-alignment eccentricity and orientation
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