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基于聚焦离子束的纳米加工技术及进展 被引量:2

Technology and progress of nano machining using focused ion beam
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摘要 随着纳米科技的不断发展,核心功能器件的纳米制造作为相关设计与应用研究的桥梁和基础,其研究价值的重要性日益凸显。聚焦离子束(Focused ion beam,FIB)加工是面向纳米尺度制造的一项重要技术。在概述FIB工作原理的同时,介绍FIB纳米加工方法与关键工艺的发展状况,就溅射产额、再沉积和FIB纳米直写方法等展开讨论。并介绍FIB纳米加工技术在纳米功能器件制造和基础研究等领域的典型应用。对其未来的发展从装备和机理研究的角度进行了展望。 The continuously developing nanotechnology gives an increasing prominence to nanometer manufacturing of core functional device, which functions as a bridge between the relevant design and ap- plication research. The focused ion beam machining represents an important technology for nanoscale manufacturing. This paper starts with an overview of the, and of the development of method and key tech- nology of FIB nano machining and the discussion of sputtering yield, redeposition and FIB nano direct writing method and so on, proceeds to the typical applications of FIB nano machining technology in the areas of basic research and manufacturing nanometer functional device, and ends with the development prospect in the different view of the gear and mechanism.
出处 《黑龙江科技学院学报》 CAS 2013年第3期211-221,共11页 Journal of Heilongjiang Institute of Science and Technology
关键词 聚焦离子束 纳米制造 先进制造 chrome wear-resisting cast iron metallography of friction nanometer modification
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  • 1雷源忠.我国机械工程研究进展与展望[J].机械工程学报,2009,45(5):1-11. 被引量:42
  • 2UTKE I,MOSHKALEV S,RUSSELL P.Nanofabrication using focused ion and electron beams:principles and applications[M].Oxford:Oxford University Press,2012.
  • 3TSENG A A.Recent developments in micromilling using focused ion beam technology[J].J Micromech Microeng,2004,14(4):15-34.
  • 4LIANG P,PARK Y,XIONG Y,et al.Maskless plasmonic lithography at 22 nm sesolution[J].Scientific Reports,2011,1:175.
  • 5LIN Y Y,LIAO J D,JU Y H,et al.Focused ion beam-fabricated Au micro/nanostruetures used as a surface enhanced raman scattering-active substrate for trace detection of molecules and influenza virus[J].Nanotechnology,2011,22:185308.
  • 6REYNTJENS S,PUERS R.A review of focused ion beam applications in microsystem technology[J].J Micromech Microeng,2001,11:287-300.
  • 7REO KOMETANI,TAKAYUKI HOSHINO,KAZUHIRO KANDA,Three-dimensional high-performance nano-toolsfabricated using focused-ion-beam chemical-vapor-deposition[J].Nucl Instrum Methods Phys Res B,2005,232:362-366.
  • 8VOLKERT C A,MINOR A M.Focused ion beam microscopy and micromachining[J].Mrs Bulletin,2007,32:389-399.
  • 9LIGH,XUZW,FANGFZ,etal.Micro cutting of V-shaped cylindrical grating template for roller nano-imprint[OL].[2012-12-10].J Mater Process Tech,2013,http://dx.doi.org/10.1016/j.jmatprotec.
  • 10FANGFZ,XUZW,HU XT,et al.Nano-photomask fabrication using focused ion beam direct writing[J].CIRP AnnalsManufacturing Technology,2010,59 (1):543-546.

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