期刊文献+

碳含量对WCN纳米复合薄膜结构和性能的影响 被引量:3

Effect of Carbon Content on Properties and Microstructure of WCN Nano-composite Films
下载PDF
导出
摘要 采用多靶反应磁控溅射技术在不同碳靶功率(碳靶功率与碳含量成正比)下制备了WCN纳米复合膜,采用X射线衍射仪、扫描电镜、纳米压痕仪和高温摩擦磨损仪等对薄膜结构和性能进行表征,研究了碳含量对WCN复合膜的影响。结果表明:随碳靶功率即碳含量的增加,薄膜的物相在原单一WN相的基础上,出现了新相WCN,并且晶格常数不断增大,同时薄膜的硬度和弹性模量先升后降,在碳靶功率为120W时,两者均达到最大值,分别为36.70,409.16GPa;复合膜的常温摩擦因数和磨损率随碳含量的增加呈现先减小后增大趋势,高温时薄膜的摩擦因数高于常温的;薄膜的主要磨损机理是磨粒磨损。 WCN nano-composite films were fabricated by multitarget reactive magnetron sputtering technology at different C target powers which were proportional to carbon contents. The properties and microstructure of these films were investigated by ray diffraction, scan electron microscopy, nano-indentor and high temperature tribometer. And the effects of carbon content on the properties of films were studied. The results show that a new phase of WCN grew in the film which had single phase of WN and the lattice constant of the film increased, when the power of C target (C content) increased. The hardness, elastic modulus of composite films rose up first than dropped down with the carbon content increasing, and the highest values of 36. 70 GPa for hardness and 409.16 GPa for elastic modulus were gotten when the power of C target was 120 W. The friction coefficient and wear rate for composite films decreased and then increased with increasing of C content at room temperature. The friction coefficient was higher at high temperature than room temperature. Abrasive wear was the main wear mechanism for the films.
出处 《机械工程材料》 CAS CSCD 北大核心 2013年第8期50-54,共5页 Materials For Mechanical Engineering
基金 国家自然科学基金资助项目(51074080) 江苏省自然科学基金资助项目(BK2008240)
关键词 WCN复合膜 反应磁控溅射 微观结构 显微硬度 WCN composite film reactive magnetron sputtering microstructure microhardness
  • 相关文献

参考文献20

  • 1YU B H, WANG C L, SONG X Y. Structural stability and mechanical property of WN from first-principles calculations[J].J Alloy Compound, 2009 ,487 (1/2): 556-559.
  • 2OSPINA R, CASTILLO H A, BENAVIDES V, et al. Influ?ence of the annealing temperature on a crystal phase of W /WC bilayers grown by pulsed arc discharge[J]. Vacuum, 2006,81 (3) :373-377.
  • 3UEKUBO M, OKU T, NIl K, et al . WNT diffusion barriers between Si and Cu[J]. Thin Solid Films, 1996,286 (l/2) : 170- 175.
  • 4NICOLET M A, SUNI I, FINNETI M. Amorphous metallic alloys in semiconductor contact metallizations[J]. Solid State Technol, 198,26(2) : 129-133.
  • 5董松涛,喻利花,薛安俊,许俊华.TiAlN/CrAlN纳米结构多层膜的结构与性能[J].材料热处理学报,2010,31(8):121-126. 被引量:6
  • 6喻利花,薛安俊,董松涛,许俊华.Si含量对Ti-Al-Si-N薄膜微结构与力学性能的影响[J].材料热处理学报,2010,31(7):140-145. 被引量:16
  • 7喻利花,薛安俊,董松涛,许俊华.AlN/NbN纳米结构多层膜的共格异结构外延生长研究[J].物理学报,2010,59(6):4150-4155. 被引量:3
  • 8SU Y D, HU C Q, WEN M, et al . Effects of bias voltage and annealing on the structure and mechanical properties of WC,1.75 No. 25 thin films[J].J Alloy Compd , 2009,486 (l/2) : A 357-364.
  • 9OSPINAR,JURAIX)J F, VELEZJ M. etal. Structural and morphological characterization WCxNy thin films grown by pulsed vacuum arc discharge in an argon-nitrogen atmosphere[J]. Surface and Coatings Technology. 2010. 205 (7): 2191- 2196.
  • 10汪蕾,董师润,尤建飞,喻利花,李学梅,许俊华.Ti(C,N)复合膜和TiN/Ti(C,N)多层膜组织和显微硬度[J].材料热处理学报,2010,31(2):113-118. 被引量:15

二级参考文献79

共引文献57

同被引文献14

引证文献3

二级引证文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部