摘要
综述了 - 族化合物半导体量子线场效应管的研究进展情况 ,阐述了量子线结构场效应管的制作工艺原理、制备方法、材料结构及器件的电学性能。指出了当前存在的工艺困难 ,并展望了进一步的发展趋势。
The lately development of Ⅲ-Ⅴ compound semiconductor quantum-wires field-effective transistors(QWRs-FET)is presented in this paper.The technique principles,fabrication methods,material structure as well as the electronic characteristics of the device are described.The difficulties involving fabrication technique are discussed.
出处
《半导体情报》
2000年第6期25-28,共4页
Semiconductor Information
关键词
量子线场效应管
平面栅场效应管
半导体场效应管
quantum wires
quantum-wires field-effective transistors
in-plane gate FET
MESFET