摘要
紫外光刻、电铸和注塑(UV-LIGA)技术是制作太赫兹真空电子器件(包括谐振腔、电子注通道和输出波导等)的重要方法。采用UV-LIGA技术制作340 GHz折叠波导慢波结构,研究前烘、曝光量、后烘对SU8胶模的影响,着重讨论了曝光量的影响并分析其原因,得出最佳工艺。另外,本文还对去胶进行了初步研究,获得了全铜的340 GHz的折叠波导结构。
Ultraviolet Lithographie, Galvanoformung and Abformung(UV-LIGA) is an attractive technique to fabricate THz vacuum electron devices including resonance cavities, electron beam tunnels and output waveguides. This paper studies the effects of the softbake, the exposure dosage and the postbake on SU8 models, highlighting the effect of the exposure dosage and its mechanics, and then obtains the optimized process parameters. The methods of SU8 removal are studied as well, and a 340 GHz all-copper Folded Waveguide(FWG) Slow Wave Structure(SWS) is fabricated.
出处
《太赫兹科学与电子信息学报》
2013年第4期527-530,共4页
Journal of Terahertz Science and Electronic Information Technology
关键词
紫外光刻
电铸和注塑技术
SU8胶模
曝光量
340
GHz折叠波导
Ultraviolet Lithographie,Galvanoformung and Abformung technique
SU8
exposuredosage
340 GHz Folded Waveguide