摘要
对具有渐变式折射率分布布拉格反射层(GRIN-DBR)的发光二极管进行了研究。研究发现,在传统分布布拉格反射层(C-DBR)的AlAs/Al0.45Ga0.55As的界面处插入5nm厚的折射率渐变层,可以使DBR的反射带宽从82nm增加到103nm。在20mA注入电流下,具有GRIN-DBR的发光二极管与具有C-DBR的发光二极管的正向电压没有明显区别,而其光通量比具有C-DBR的发光二极管高8%。
Light-emitting diodes (LEDs Bragg reflectors (DBRs) are investigated. It nm to 103 nm by inserting a 5 nm-thick ) is with graded refractive index (GRIN) distributed found that the stop bandwidth is increased from 82 GRIN layer at the interface between AIAs and A10.45Ga0.55As of conventional DBRs (C-DBRs). Under 20 mA injection current, there is no obvi- ous difference for the forward voltages of the LEDs with GRIN-DBRs and the LEDs with C- DBRs. Furthermore, the luminous flux of the LEDs with GRIN-DBRs is 8% higher.
出处
《固体电子学研究与进展》
CAS
CSCD
北大核心
2013年第4期355-358,共4页
Research & Progress of SSE
基金
国家高技术研究发展计划(863计划)资助项目(2011AA03A112)