摘要
在多束动态混合(MBMI)-注入系统上利用MBMI技术制备TiN膜,XRD分析表明,N+入射角度α(°)、氮钛原子到达比RN/Ti、 N2分压PN2对膜生长的择优取向及相结构有影响;性能研究结果表明。高的入射离子能量Ei、基体温度Ts以及合适的RN/Ti对TiN膜的显微硬度HK和膜-基结合力都有正面影响。
TiN thick films were prepared by multi-ion-beam dynamic mixing implanting (MBMI) technology and their structure and characteristics were analyzed by XRD, microhardness analysis and scratch test. The structure analysis results indicate that the phase structure of TiN films are affected by the implantation angle of nitrogen ion, the nitrogen to titanium atom ratio and the pressure of nitrogen gas. The performance tests show that higher temperature of substrate Ts and suitable RN/Ti are important for increasing the microhardness (HK) of TiN films and the stickiness between TiN film and substrate.
出处
《核技术》
CAS
CSCD
北大核心
2000年第10期678-682,共5页
Nuclear Techniques
关键词
氮化钛膜
制备
结构
性能
MBMI
IBAD
Multi-ion-beam dynamic mixing, Ion beam enhanced deposition, Ion implantation, Preferred orientation
