X射线能量色散谱表征纳米多层膜的调制结构

Characterization of Modulation Structure of Nano- Multilayers with Energy Dispersive X-ray

提出并讨论了采用 X射线色散谱 ( EDX)技术表征纳米多层膜调制结构的原理和方法 ,对Ti N/ Nb N纳米多层膜的调制结构特征进行了表征 ,并与横截面透射电子显微镜 ( TEM)表征方法进行比较 .结果表明 ,对于多层膜的调制比 ,EDX是一种更为精确和方便的方法 .采用 EDX结合 X射线衍射 ( XRD)技术可以准确、方便地表征纳米多层膜的调制结构 .

This paper presented and discussed a method and its principles to characterize the modulation structure of nano- multilayers with energy dispersive X- ray( EDX) techniques.The characteristics of mod- ulation structure of Ti N/Nb N multilayers were quantitatively described.Meanwhile,a contrast was made between this method and the cross- section TEM method.The results show that EDX method performs more exactly and conveniently in modulation ratio measurement of nano- multilayers,and their modulation structure can be exactly and conveniently characterized by EDX coupled with XRD.