1555nm宽带通滤光膜的设计和优化

Design and optimization of 1 555 nm broad-bandpass filter film

针对对空间通信的特殊需求,设计并制备了1 555 nm波段的高透过率、宽带通滤光膜,该滤光膜在高温高湿环境下能够稳定工作。根据薄膜设计理论,选取折射率差大的TiO2和SiO2作为镀膜材料,采用规整膜系进行膜系设计。借助Optilayer软件,采用针形优化和双面镀膜方法,得到优化的非规整膜系。采用直接与间接监控相结合的手段监控薄膜生长,并探讨了薄膜的生长条件。在电子束蒸发离子辅助沉积条件下,制备出中心波长处透过率达到97%,带宽为50 nm的滤光膜。在100℃高温和-30℃低温各保持3 h的条件下,波长漂移仅0.2 nm,具有高的稳定性和可靠性,满足空间通信的使用要求。

According to the special requirements of space communication,a 1 555 nm high transmittance and broad band-pass filter was designed and prepared to operate under high temperature and high humidity environments.TiO2 and SiO2 were selected as coating materials to produce a large refractive index difference and the Quarter-wave Optical Thickness（QWOT） film was designed based on the design theory.Then,the nonQWOT film was optimized by using the needle optimization and double sided coating by Optilayer software.The monitoring technique in the experiment was combined with direct monitoring and indirect monitoring,and the method were also discussed.A filter film with a transmittance of 97% in the center wavelength and a halfwidth of 50 nm was manufactured under electron beam evaporation by ion assisted.Experiments show that the wavelength shift of the filter film is only 0.2 nm in a high temperature of 100 ℃ and a low temperature of 30 ℃ for 3 hours each.Moreover,the film maintains high stability and reliability,which meets the requirements of space communication.