铜氧化过程中其表面“非晶膜”的AES和HREM分析

HREM and AES Study on the Amorphous Layer Formed on the Surface of Copper During Copper Oxidation

利用电子显微镜中的电子束对铜的薄膜样品进行了连续的照射和跟踪观察 ,结果发现 ,Cu在氧化过程中首先出现的是一层非晶膜 ,这层非晶膜在电子束的照射下转变成了Cu的晶体氧化物 .AES和HREM分析结果表明 ,Cu表面出现的这层非晶膜 ,它的主要成分为Cu和O ,在铜的氧化过程中起着一种氧化界面的作用 .也就是说 ,Cu的氧化要经历两个阶段 ,首先是Cu与O结合形成非晶膜 ,接着非晶膜在适当的时候转变为铜的晶态氧化物 .

We have investigated the composition of an amorphous layer formed on copper surface and its role in copper oxidation by using AES and HREM techniques. We suggest that both copper and oxygen are the main components of such an amorphous layer, The unit of such a layer may be a —Cu—O—Cu—O— chain. The layer can grow up by depletion of copper and transform into copper oxides under appropriate conditions. The observed results show obviously that a two_step mechanism for copper oxidation, namely the interaction of copper with oxygen, tends to form an amorphous layer first, and then such an amorphous layer transforms into copper oxides under appropriate conditions.