摘要
采用非平衡磁控溅射与阳极离子束技术制备Cr/α-C:H膜系,同时采用多弧离子镀技术分别制备Cr/CrNx与Ti/TiNx膜系,膜层厚度均为2μm。利用扫描电子显微镜、原子力显微镜、Raman光谱、X射线衍射仪分析三种薄膜的微观结构和表面形貌;采用WS-2005型附着力划痕仪测试三种膜系与SKD11不锈钢基体的结合强度;采用自主研制的球磨仪测试制备在SKD11不锈钢与YG6硬质合金基体上的三种膜层耐磨性能。结果表明,利用阳极离子束技术制备的α-C:H膜是一种非晶结构、表面平滑的薄膜,粗糙度值仅为5.21 nm,划痕试验临界载荷为17.8 N。而晶态的TiNx与CrNx膜层粗糙度较高,且其表面存有'熔滴',但其结合强度较高,划痕试验临界载荷达80 N以上。α-C:H膜层的耐磨性能优于TiNx,CrNx,且沉积在YG6硬质合金基体上的膜层单位磨损率均比SKD11不锈钢基体上的膜层低。
Cr/α-C:H films system are prepared by unbalanced magnetron sputtering and anode ion beam technique,and Cr/CrNxand Ti/TiNxfilms systems are prepared by multi-arc ion plating technique.The thicknesses of films are 2 μm.The microstructures and the morphologies of the resulting of three films systems are investigated by scanning electron microscopy,atomic force microscopy,Raman spectroscopy and X-ray diffractometer,respectively.The mechanical and the tribological properties of the films are studied by WS-2005 scratch tester,and ball cratering tester.The results show that α-C:H films prepared by anode ion beam technique are films with non-crystal structure and smooth surface,the roughness value is only 5.21 nm,highest critical load is 17.8 N in scratch test,while the roughness value of crystal Ti/TiNx films systems are higher,and there’s droplet on the surface,but the adhesive strength of Ti/TiNx and Cr/CrNx films to the substrate are higher,and the highest critical load is up to more than 80 N in scratch test.The tribological properties of α-C:H film is better than TiNxand CrNxfilms.The unit wear rate of films to the substrate of YG6 cemented carbide is lower than the films to the substrate of SKD11 stainless steel.
出处
《机械工程学报》
EI
CAS
CSCD
北大核心
2013年第16期91-99,共9页
Journal of Mechanical Engineering
基金
国家自然科学基金(51105207)
中国博士后科学基金(2011M500924)
江苏省研究生创新基金(CX10B_113Z)资助项目