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真空蒸馏分离-电感耦合等离子体质谱法测定高纯碲中9种杂质元素 被引量:9

Vacuum Distillation Separation/Enrichment and Determination of Nine Impurities in High Purity Tellurium by ICP-MS
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摘要 建立了真空蒸馏分离-ICP-MS法测定高纯碲中的9种杂质元素的方法。采用真空蒸馏技术使基体碲与待测元素分离,有效克服了基体对待测元素的干扰和对仪器进样系统的污染。通过优化仪器参数和加入内标,提高了分析准确度。研究了温度和时间对分离效果的影响。当称样量为1.000 g时,最佳分离条件为450℃和3 h。将本方法与ICP-AES-直接溶样法、GD-MS法进行了对照,结果表明,本方法准确可靠。在选定的实验条件下,方法检出限(3σ)为1.4~6.1 ng/g,相对标准偏差为(RSD)为2.8%~7.3%,加标回收率为94.8%~103.0%。本方法简单实用,能够满足大量纯度为5N(99.999%)和6N(99.9999%)的高纯碲中9种杂质元素的测定。 A method was developed for the determination of nine different impurities in high purity tellurium by ICP-MS after vacuum distillation separation.The interferences on analytes and the pollution of sample introduction system were efficiently avoided by separation impurity elements from matrix Te.By optimizing the instrumental parameters and addition of internal standards,the analytical accuracy was further improved.The influences of temperature and time on separation effects have been studied.It showed that the optimal separating temperature and time were 450 ° C and 3 h,respectively,when sample weight was 1.0000 g.The analytical results proved to be accurate and validated by comparison of proposed method with ICP-AES and GD-MS.Under optimized conditions,the detection limits of 1.4-6.1 ng/g and the RSDs of 2.8%-7.3% were obtained,and the recoveries of standard addition were 94.8%-103.0%.The method was suitable for the determination of impurities in high purity tellurium of 99.999% and 99.9999%.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 2013年第9期1454-1457,共4页 Chinese Journal of Analytical Chemistry
关键词 电感耦合等离子体质谱(ICP-MS) 高纯碲 真空蒸馏分离 杂质元素 Inductively coupled plasma mass spectrometry High purity tellurium Vacuum distillation Impurities
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  • 1张锦茂,范凡,任萍.氢化物-原子荧光法测定岩石中痕量硒的干扰及消除[J].岩矿测试,1993,12(4):264-267. 被引量:42
  • 2张朝阳,马名扬,苏流坤.ICP-AES测定高纯碲中11种杂质元素[J].光谱实验室,2005,22(1):134-136. 被引量:7
  • 3孙伟嬿,陈蓉玉.等离子体原子发射光谱法测定高纯碲锭中杂质元素的研究[J].化学世界,2005,46(5):266-268. 被引量:3
  • 4荣百炼.碲镉汞薄膜的MOVPE生长及其电学性质研究[M].南京理工大学(硕士)学位论文,2002,7:45-47.
  • 5Wojcech Vieth, John C Huneke. Quantatitative Depth Profile Analysis Using High Resolution Glow Discharge Mass Spectrometry[J].Spectrochemica Acta, 1991, 4611(2): 137-153.
  • 6Harrison WW, Bentz BL. Glow Discharge Mass Spectrometry[J]. Prog Analyt Spectrosc, 1988(11): 54-63.
  • 7D.M.P. Milton. VG laser and 9000 sample analysis report[R]. Application Reports. VGE/SM/AR/186. 1996(1): 2-5.
  • 8Detlef Gunther, Bodo Hattendorf. Solid sample analysis using laser ablation inductively coupled plasma mass spectrometry[J]. Trends in Analytical Chemistry, 2005, 24(3): 255-265.
  • 9.中华人民共和国国家标准.碲化学分析方法[s].GB 2137.2147—80[M].北京,中国标准出版社,1980..
  • 10Prasad D S,Munirathnam N R,Reo J V,et al.Purification of tellurium up to 5N by vacuum distillation[J].Materials Letters,2005,59:2035-2038.

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