垂直磁场作用下电沉积数值分析与实验

Numerical analyses and experiments of electrodeposition in vertical magnetic field

对电沉积过程中磁场、电场和流场进行数值分析并利用COMSOL仿真软件进行数值求解,得到了无磁场作用和0.2T垂直磁场作用下流体流场分布、镀液中电场分布以及不同时间段镀层厚度变化特征的数值结果,并对其进行了对比分析.为了解磁场对电沉积过程的影响规律,分别在施加0、0.2、0.4和0.8T磁场作用下电沉积镍,对比实验和数值分析结果表明,镀层厚度仿真值和实验值变化趋势接近,无磁场条件下平均绝对偏差为0.443μm,0.2T磁场条件下平均绝对偏差为0.425μm.施加0.2T垂直磁场作用后,镀层的平均厚度较无磁场作用下增加了11%,与仿真结果一致,并且随着磁场强度的增加,镀层晶粒细化度、表面质量得到进一步提高.分析结果表明数值分析可以较为精确地反映磁场对电沉积过程的影响作用.

The coupling mathematical model of magnetic field, electric field and flow field in the electrodeposition process is established and numerically simulated by using COMSOL. The numerical results are obtained and comparatively analyzed, which are the distribution of the fluid flow field, the electric field distribution characteristics of the bath and the coating thickness variation characteristics in different periods of the plating without magnetic field and in 0.2 T vertical magnetic field. In order to study the effect law of magnetic field on the electric deposition process, electrodeposited nickel experiments are conducted in the conditions of 0, 0.2, 0. 4 and 0. 8 T vertical magnetic field. The experimental results show that the simulated value of coating thickness variation tendency is close to the experimental value, and the average absolute deviation is 0. 443 t^m without magnetic condition and 0.425 /~m in 0. 2 T magnetic field. Compared with non-magnetic field, the average thickness of the coating increases by 11% when 0. 2 T vertical magnetic field is applied, which is consistent with the simulation results. The experimental results also indicate that the coating grain refinement and surface quality have been improved with the increase of magnetic field strength, and numerical analyses can more accurately reflect the effects of the magnetic field on the electrodeposition process.