湿法制作连续微透镜列阵新方法

A New Method for Fabrication of Continuous Micro Lens Array with Wet Etching

制作连续微透镜列阵中主要的问题就是浮雕的深度和浮雕面形的控制 ,已有的微透镜列阵制作方法不能很好地解决 ;本文提出了一种利用干法和湿法蚀刻结合在硅片上制作连续深浮雕微透镜列阵的新方法 ,得到了深度

The main problems in making continuous micro lens array are to control the depth of relief and relief surface shape.The existing methods cannot solve these problems.A new method for making continuous relief micro lens on the wafer by the combination of dry and wet etching is proposed in the paper.Micro cylindrical surfaces with a depth of 40μm and rotary parabolic surface micro lens array are obtained.